Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
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The dependence of the etching property of CoSi2 films in diluted HF solutions on the formation conditions
The dependence of the etching property of CoSi2 films in diluted HF solutions on the formation conditions
The dependence of the etching property of CoSi2 films in diluted HF solutions on the formation conditions
Zhu, S. (Autor:in) / Ru, G. (Autor:in) / Detavernier, C. (Autor:in) / Van Meirhaeghe, R. L. (Autor:in) / Cardon, F. (Autor:in) / Li, B. (Autor:in)
APPLIED SURFACE SCIENCE ; 178 ; 44-49
01.01.2001
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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