Field Emission Properties of Nanocrystalline and Amorphous Silicon Carbon Nitride Prepared from Microwave Plasma Chemical Vapor Deposition: Fid-Bau Portal

Field Emission Properties of Nanocrystalline and Amorphous Silicon Carbon Nitride Prepared from Microwave Plasma Chemical Vapor Deposition

Cheng, W. J. / Jiang, J. C. / Zhang, Y. / Shen, D. Z. / Zhu, H. S.

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Field Emission Properties of Nanocrystalline and Amorphous Silicon Carbon Nitride Prepared from Microwave Plasma Chemical Vapor Deposition

Cheng, W. J. / Jiang, J. C. / Zhang, Y. / Shen, D. Z. / Zhu, H. S.

Field Emission Properties of Nanocrystalline and Amorphous Silicon Carbon Nitride Prepared from Microwave Plasma Chemical Vapor Deposition

Cheng, W. J. / Jiang, J. C. / Zhang, Y. / Shen, D. Z. / Zhu, H. S.

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Check availability in my library

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Document information

Title:

Field Emission Properties of Nanocrystalline and Amorphous Silicon Carbon Nitride Prepared from Microwave Plasma Chemical Vapor Deposition

Contributors:

Cheng, W. J. (author) / Jiang, J. C. (author) / Zhang, Y. (author) / Shen, D. Z. (author) / Zhu, H. S. (author) / Mendez-Vilas, A.

Published in:

Cross-Disciplinary Applied Research in Materials Science and Technology ; 65-70

MATERIALS SCIENCE FORUM ; 480/481

Publication date:

2005-01-01

Size:

6 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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