Optical and electrical properties of p-type transparent conducting Cu-Al-O thin films prepared by plasma enhanced chemical vapor deposition: Fid-Bau Portal

Optical and electrical properties of p-type transparent conducting Cu-Al-O thin films prepared by plasma enhanced chemical vapor deposition

Wang, Y. / Gong, H. / Zhu, F. / Liu, L. / Huang, L. / Huan, A. C.

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Optical and electrical properties of p-type transparent conducting Cu-Al-O thin films prepared by plasma enhanced chemical vapor deposition

Wang, Y. / Gong, H. / Zhu, F. / Liu, L. / Huang, L. / Huan, A. C.

Optical and electrical properties of p-type transparent conducting Cu-Al-O thin films prepared by plasma enhanced chemical vapor deposition

Wang, Y. / Gong, H. / Zhu, F. / Liu, L. / Huang, L. / Huan, A. C.

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Document information

Title:

Optical and electrical properties of p-type transparent conducting Cu-Al-O thin films prepared by plasma enhanced chemical vapor deposition

Contributors:

Wang, Y. (author) / Gong, H. (author) / Zhu, F. (author) / Liu, L. (author) / Huang, L. (author) / Huan, A. C. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 85 ; 131 - 134

Publication date:

2001-01-01

Size:

4 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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