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Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition

Jeong, C. W. / Lee, B. i. / Joo, S. K.

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Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition

Jeong, C. W. / Lee, B. i. / Joo, S. K.

Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition

Jeong, C. W. / Lee, B. i. / Joo, S. K.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition

Contributors:

Jeong, C. W. (author) / Lee, B. i. (author) / Joo, S. K. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -AMSTERDAM THEN LAUSANNE- C ; 16 ; 59-64

Publication date:

2001-01-01

Size:

6 pages

ISSN:

0928-4931

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.1 / 660

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