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Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
Kim, D. H. (author) / Kim, Y. J. (author) / Park, J. H. (author) / Kim, J. H. (author)
2004-01-01
3 pages
Article (Journal)
English
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