Correlation between processing and properties of TiOxNy thin films sputter deposited by the reactive gas pulsing technique: Fid-Bau Portal

Correlation between processing and properties of TiOxNy thin films sputter deposited by the reactive gas pulsing technique

Martin, N. / Banakh, O. / Santo, A. M. / Springer, S. / Sanjines, R. / Takadoum, J. / Levy, F.

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Correlation between processing and properties of TiOxNy thin films sputter deposited by the reactive gas pulsing technique

Martin, N. / Banakh, O. / Santo, A. M. / Springer, S. / Sanjines, R. / Takadoum, J. / Levy, F.

Correlation between processing and properties of TiOxNy thin films sputter deposited by the reactive gas pulsing technique

Martin, N. / Banakh, O. / Santo, A. M. / Springer, S. / Sanjines, R. / Takadoum, J. / Levy, F.

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Check availability in my library

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Document information

Title:

Correlation between processing and properties of TiOxNy thin films sputter deposited by the reactive gas pulsing technique

Contributors:

Martin, N. (author) / Banakh, O. (author) / Santo, A. M. (author) / Springer, S. (author) / Sanjines, R. (author) / Takadoum, J. (author) / Levy, F. (author)

Published in:

APPLIED SURFACE SCIENCE ; 185 ; 123-133

Publication date:

2001-01-01

Size:

11 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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