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Nitrogen pulsing to modify the properties of titanium nitride thin films sputter deposited

Martin, N. / Lintymer, J. / Gavoille, J. / Takadoum, J.

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Nitrogen pulsing to modify the properties of titanium nitride thin films sputter deposited

Martin, N. / Lintymer, J. / Gavoille, J. / Takadoum, J.

Nitrogen pulsing to modify the properties of titanium nitride thin films sputter deposited

Martin, N. / Lintymer, J. / Gavoille, J. / Takadoum, J.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

Title:

Nitrogen pulsing to modify the properties of titanium nitride thin films sputter deposited

Contributors:

Martin, N. (author) / Lintymer, J. (author) / Gavoille, J. (author) / Takadoum, J. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE ; 37 ; 4327-4332

Publication date:

2002-01-01

Size:

6 pages

ISSN:

0022-2461

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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