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Titanium oxynitride thin films sputter deposited by the reactive gas pulsing process

Chappe, J. M. / Martin, N. / Lintymer, J. / Sthal, F. / Terwagne, G. / Takadoum, J.

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Titanium oxynitride thin films sputter deposited by the reactive gas pulsing process

Chappe, J. M. / Martin, N. / Lintymer, J. / Sthal, F. / Terwagne, G. / Takadoum, J.

Titanium oxynitride thin films sputter deposited by the reactive gas pulsing process

Chappe, J. M. / Martin, N. / Lintymer, J. / Sthal, F. / Terwagne, G. / Takadoum, J.

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Check availability in my library

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Document information

Title:

Titanium oxynitride thin films sputter deposited by the reactive gas pulsing process

Contributors:

Chappe, J. M. (author) / Martin, N. (author) / Lintymer, J. (author) / Sthal, F. (author) / Terwagne, G. (author) / Takadoum, J. (author)

Published in:

APPLIED SURFACE SCIENCE ; 253 ; 5312-5316

Publication date:

2007-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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