Influence of the Plasma Regime on the Structural, Optical, Electrical and Morphological Properties of a-Si:H Thin Films: Fid-Bau Portal

Influence of the Plasma Regime on the Structural, Optical, Electrical and Morphological Properties of a-Si:H Thin Films

Aguas, H. / Martins, R. / Nunes, Y. / Maneira, M. / Fortunato, E.

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Influence of the Plasma Regime on the Structural, Optical, Electrical and Morphological Properties of a-Si:H Thin Films

Aguas, H. / Martins, R. / Nunes, Y. / Maneira, M. / Fortunato, E.

Influence of the Plasma Regime on the Structural, Optical, Electrical and Morphological Properties of a-Si:H Thin Films

Aguas, H. / Martins, R. / Nunes, Y. / Maneira, M. / Fortunato, E.

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Check availability in my library

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Document information

Title:

Influence of the Plasma Regime on the Structural, Optical, Electrical and Morphological Properties of a-Si:H Thin Films

Contributors:

Aguas, H. (author) / Martins, R. (author) / Nunes, Y. (author) / Maneira, M. (author) / Fortunato, E. (author)

Published in:

MATERIALS SCIENCE FORUM ; 382 ; 11-20

Publication date:

2001-01-01

Size:

10 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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