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Non-destructive characterisation of doped Si and SiGe epilayers using FTIR spectroscopic ellipsometry (FTIR-SE)
Non-destructive characterisation of doped Si and SiGe epilayers using FTIR spectroscopic ellipsometry (FTIR-SE)
Non-destructive characterisation of doped Si and SiGe epilayers using FTIR spectroscopic ellipsometry (FTIR-SE)
Pickering, C. (author) / Leong, W. Y. (author) / Glasper, J. L. (author) / Boher, P. (author) / Piel, J. P. (author)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 89 ; 146 - 150
2002-01-01
5 pages
Article (Journal)
English
DDC:
620.11
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