Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
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Non-destructive characterisation of doped Si and SiGe epilayers using FTIR spectroscopic ellipsometry (FTIR-SE)
Non-destructive characterisation of doped Si and SiGe epilayers using FTIR spectroscopic ellipsometry (FTIR-SE)
Non-destructive characterisation of doped Si and SiGe epilayers using FTIR spectroscopic ellipsometry (FTIR-SE)
Pickering, C. (Autor:in) / Leong, W. Y. (Autor:in) / Glasper, J. L. (Autor:in) / Boher, P. (Autor:in) / Piel, J. P. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 89 ; 146 - 150
01.01.2002
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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