Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Etch characteristics of HfO2 films on Si substrates

    New search for: Norasetthekul, S.
    New search for: Park, P. Y.
    New search for: Baik, K. H.
    New search for: Lee, K. P.
    New search for: Shin, J. H.
    New search for: Jeong, B. S.
    New search for: Shishodia, V.
    New search for: Norton, D. P.
    New search for: Pearton, S. J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Etch characteristics of HfO2 films on Si substrates

    New search for: Norasetthekul, S.
    New search for: Park, P. Y.
    New search for: Baik, K. H.
    New search for: Lee, K. P.
    New search for: Shin, J. H.
    New search for: Jeong, B. S.
    New search for: Shishodia, V.
    New search for: Norton, D. P.
    New search for: Pearton, S. J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Etch characteristics of HfO2 films on Si substrates

    New search for: Norasetthekul, S.
    New search for: Park, P. Y.
    New search for: Baik, K. H.
    New search for: Lee, K. P.
    New search for: Shin, J. H.
    New search for: Jeong, B. S.
    New search for: Shishodia, V.
    New search for: Norton, D. P.
    New search for: Pearton, S. J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Etch characteristics of HfO2 films on Si substrates

    Contributors:

    Norasetthekul, S. (author) / Park, P. Y. (author) / Baik, K. H. (author) / Lee, K. P. (author) / Shin, J. H. (author) / Jeong, B. S. (author) / Shishodia, V. (author) / Norton, D. P. (author) / Pearton, S. J. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 187 ; 75-81

    Publication date:

    2002-01-01

    Size:

    7 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    Characteristics of sandwich-structured Al2O3/HfO2/Al2O3 gate dielectric films on ultra-thin silicon-on-insulator substrates

    Cheng, X. / Song, Z. / Jiang, J. et al. | British Library Online Contents | 2005

    Acid etch resistance for calcareous substrates

    ROSEN BRAD M / SHENOY SIDDHARTHA R / RAGHAVANPILLAI ANILKUMAR et al. | European Patent Office | 2015

    Free access

    Solid phase crystallisation of HfO2 thin films

    Modreanu, M. / Sancho-Parramon, J. / O'Connell, D. et al. | British Library Online Contents | 2005

    Microstructure tuning facilitated photo-efficiency enhancement and environmental benign nature of HfO2/Mo/HfO2 multilayer films

    Dubey, P. / Gomez, J. / Manandhar, S. et al. | British Library Online Contents | 2018

    Microstructure tuning facilitated photo-efficiency enhancement and environmental benign nature of HfO2/Mo/HfO2 multilayer films

    Dubey, P. / Gomez, J. / Manandhar, S. et al. | British Library Online Contents | 2018

    Back to top