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Layer-by-layer etching of Cl-adsorbed silicon surfaces by low energy Ar+ ion irradiation
Layer-by-layer etching of Cl-adsorbed silicon surfaces by low energy Ar+ ion irradiation
Layer-by-layer etching of Cl-adsorbed silicon surfaces by low energy Ar+ ion irradiation
Kim, B. J. (author) / Chung, S. (author) / Cho, S. M. (author)
APPLIED SURFACE SCIENCE ; 187 ; 124-129
2002-01-01
6 pages
Article (Journal)
English
DDC:
621.35
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