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    ETCHING COMPOSITION FOR SILICON NITRIDE LAYER AND METHOD FOR ETCHING SILICON NITRIDE LAYER USING THE SAME

    New search for: PARK GYEONGHUN

    An etching composition for a silicon nitride layer includes phosphoric acid, a compound represented by Chemical Formula 1, a compound represented by Chemical Formula 2, and water. In addition, a method for etching a silicon nitride layer includes contacting a surface of a silicon nitride layer with the etching composition for a silicon nitride layer.(R1)a(R2)b(CH3)Si—(OR3)(3-a-b)  Chemical Formula 1(R5)c(R6)d(R7)Si—(OR8)(3-c-d)  Chemical Formula 2

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    ETCHING COMPOSITION FOR SILICON NITRIDE LAYER AND METHOD FOR ETCHING SILICON NITRIDE LAYER USING THE SAME

    New search for: PARK GYEONGHUN

    An etching composition for a silicon nitride layer includes phosphoric acid, a compound represented by Chemical Formula 1, a compound represented by Chemical Formula 2, and water. In addition, a method for etching a silicon nitride layer includes contacting a surface of a silicon nitride layer with the etching composition for a silicon nitride layer.(R1)a(R2)b(CH3)Si—(OR3)(3-a-b)  Chemical Formula 1(R5)c(R6)d(R7)Si—(OR8)(3-c-d)  Chemical Formula 2

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    ETCHING COMPOSITION FOR SILICON NITRIDE LAYER AND METHOD FOR ETCHING SILICON NITRIDE LAYER USING THE SAME

    New search for: PARK GYEONGHUN

    An etching composition for a silicon nitride layer includes phosphoric acid, a compound represented by Chemical Formula 1, a compound represented by Chemical Formula 2, and water. In addition, a method for etching a silicon nitride layer includes contacting a surface of a silicon nitride layer with the etching composition for a silicon nitride layer.(R1)a(R2)b(CH3)Si—(OR3)(3-a-b)  Chemical Formula 1(R5)c(R6)d(R7)Si—(OR8)(3-c-d)  Chemical Formula 2

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    Title:

    ETCHING COMPOSITION FOR SILICON NITRIDE LAYER AND METHOD FOR ETCHING SILICON NITRIDE LAYER USING THE SAME

    Contributors:

    PARK GYEONGHUN (author)

    Publication date:

    2024-11-28

    Type of media:

    Patent

    Type of material:

    Electronic Resource

    Language:

    English

    Classification:

    IPC:  C09K Materialien für Anwendungen, soweit nicht anderweitig vorgesehen , MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR / C04B Kalk , LIME

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