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Room-temperature oxidation of ultrathin TiB~2 films

Huang, F. / Liu, W. J. / Sullivan, J. F. / Barnard, J. A. / Weaver, M. L.

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Room-temperature oxidation of ultrathin TiB~2 films

Huang, F. / Liu, W. J. / Sullivan, J. F. / Barnard, J. A. / Weaver, M. L.

Room-temperature oxidation of ultrathin TiB~2 films

Huang, F. / Liu, W. J. / Sullivan, J. F. / Barnard, J. A. / Weaver, M. L.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Room-temperature oxidation of ultrathin TiB~2 films

Contributors:

Huang, F. (author) / Liu, W. J. (author) / Sullivan, J. F. (author) / Barnard, J. A. (author) / Weaver, M. L. (author)

Published in:

JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 17 ; 805-813

Publication date:

2002-01-01

Size:

9 pages

ISSN:

0884-2914

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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