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    Oxidation-Induced Crystallographic Transformation in Heavily N-Doped 4H-SiC Wafers

    New search for: Skromme, B. J.
    New search for: Palle, K.
    New search for: Poweleit, C. D.
    New search for: Bryant, L. R.
    New search for: Vetter, W. M.
    New search for: Dudley, M.
    New search for: Moore, K.
    New search for: Gehoski, T.

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    Oxidation-Induced Crystallographic Transformation in Heavily N-Doped 4H-SiC Wafers

    New search for: Skromme, B. J.
    New search for: Palle, K.
    New search for: Poweleit, C. D.
    New search for: Bryant, L. R.
    New search for: Vetter, W. M.
    New search for: Dudley, M.
    New search for: Moore, K.
    New search for: Gehoski, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Oxidation-Induced Crystallographic Transformation in Heavily N-Doped 4H-SiC Wafers

    New search for: Skromme, B. J.
    New search for: Palle, K.
    New search for: Poweleit, C. D.
    New search for: Bryant, L. R.
    New search for: Vetter, W. M.
    New search for: Dudley, M.
    New search for: Moore, K.
    New search for: Gehoski, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
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    Document information
    Title:

    Oxidation-Induced Crystallographic Transformation in Heavily N-Doped 4H-SiC Wafers

    Contributors:

    Skromme, B. J. (author) / Palle, K. (author) / Poweleit, C. D. (author) / Bryant, L. R. (author) / Vetter, W. M. (author) / Dudley, M. (author) / Moore, K. (author) / Gehoski, T. (author)

    Published in:

    MATERIALS SCIENCE FORUM ; 389/393 ; 455-458

    Publication date:

    2002-01-01

    Size:

    4 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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