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Preferred Orientation of Chemical Vapor Deposited Polycrystalline Silicon Carbide Films

Kajikawa, Y. / Noda, S. / Komiyama, H.

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Preferred Orientation of Chemical Vapor Deposited Polycrystalline Silicon Carbide Films

Kajikawa, Y. / Noda, S. / Komiyama, H.

Preferred Orientation of Chemical Vapor Deposited Polycrystalline Silicon Carbide Films

Kajikawa, Y. / Noda, S. / Komiyama, H.

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Check availability in my library

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Document information

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Document information

Title:

Preferred Orientation of Chemical Vapor Deposited Polycrystalline Silicon Carbide Films

Contributors:

Kajikawa, Y. (author) / Noda, S. (author) / Komiyama, H. (author)

Published in:

ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 14 ; 99-104

Publication date:

2002-01-01

Size:

6 pages

ISSN:

0935-9648

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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