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    Thermodynamical computation and physicochemical characterization of thin films deposited by electric-discharge-assisted chemical vapor deposition

    New search for: Sassi, Z.
    New search for: Chafik, K.
    New search for: Bureau, J. C.
    New search for: Glachant, A.
    New search for: Balland, B.

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    Thermodynamical computation and physicochemical characterization of thin films deposited by electric-discharge-assisted chemical vapor deposition

    New search for: Sassi, Z.
    New search for: Chafik, K.
    New search for: Bureau, J. C.
    New search for: Glachant, A.
    New search for: Balland, B.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Thermodynamical computation and physicochemical characterization of thin films deposited by electric-discharge-assisted chemical vapor deposition

    New search for: Sassi, Z.
    New search for: Chafik, K.
    New search for: Bureau, J. C.
    New search for: Glachant, A.
    New search for: Balland, B.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Thermodynamical computation and physicochemical characterization of thin films deposited by electric-discharge-assisted chemical vapor deposition

    Contributors:

    Sassi, Z. (author) / Chafik, K. (author) / Bureau, J. C. (author) / Glachant, A. (author) / Balland, B. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 193 ; 26-35

    Publication date:

    2002-01-01

    Size:

    10 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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