A platform for research: civil engineering, architecture and urbanism
Effect of interface conditions on yield behavior of passivated copper thin films
Effect of interface conditions on yield behavior of passivated copper thin films
Effect of interface conditions on yield behavior of passivated copper thin films
Vinci, R. P. (author) / Forrest, S. A. (author) / Bravman, J. C. (author)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 17 ; 1863-1870
2002-01-01
8 pages
Article (Journal)
English
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Effect of oxygen on the thermomechanical behavior of passivated Cu thin films
British Library Online Contents | 2003
|Thermo-Mechanical Stress in Passivated Al-0.5%Cu Thin Films
British Library Online Contents | 2004
|Stress evolution in passivated thin films of Cu on silica substrates
British Library Online Contents | 1998
|Evaluation of the corrosion protection behaviour of poly(neutral red) films on passivated copper
British Library Online Contents | 2011
|Thermal strains in passivated aluminum and copper conductor lines
British Library Online Contents | 2011
|