Etching behaviour of pure and metal containing amorphous carbon films prepared using filtered cathodic vacuum arc technique: Fid-Bau Portal

Etching behaviour of pure and metal containing amorphous carbon films prepared using filtered cathodic vacuum arc technique

Yu, L. J. / Sheeja, D. / Tay, B. K. / Chua, D. H. / Milne, W. I. / Miao, J. / Fu, Y. Q.

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Etching behaviour of pure and metal containing amorphous carbon films prepared using filtered cathodic vacuum arc technique

Yu, L. J. / Sheeja, D. / Tay, B. K. / Chua, D. H. / Milne, W. I. / Miao, J. / Fu, Y. Q.

Etching behaviour of pure and metal containing amorphous carbon films prepared using filtered cathodic vacuum arc technique

Yu, L. J. / Sheeja, D. / Tay, B. K. / Chua, D. H. / Milne, W. I. / Miao, J. / Fu, Y. Q.

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Document information

Title:

Etching behaviour of pure and metal containing amorphous carbon films prepared using filtered cathodic vacuum arc technique

Contributors:

Yu, L. J. (author) / Sheeja, D. (author) / Tay, B. K. (author) / Chua, D. H. (author) / Milne, W. I. (author) / Miao, J. (author) / Fu, Y. Q. (author)

Published in:

APPLIED SURFACE SCIENCE ; 195 ; 107-116

Publication date:

2002-01-01

Size:

10 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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