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    Investigation of RF power effect on the deposition and properties of PECVD TiSi2 thin film

    New search for: Fouad, O. A.
    New search for: Yamazato, M.
    New search for: Nagano, M.

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    Investigation of RF power effect on the deposition and properties of PECVD TiSi2 thin film

    New search for: Fouad, O. A.
    New search for: Yamazato, M.
    New search for: Nagano, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Investigation of RF power effect on the deposition and properties of PECVD TiSi2 thin film

    New search for: Fouad, O. A.
    New search for: Yamazato, M.
    New search for: Nagano, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Investigation of RF power effect on the deposition and properties of PECVD TiSi2 thin film

    Contributors:

    Fouad, O. A. (author) / Yamazato, M. (author) / Nagano, M. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 195 ; 130-136

    Publication date:

    2002-01-01

    Size:

    7 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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