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    Effect of in situ H2-plasma cleaning on TiSi2 film properties in plasma enhanced chemical vapor deposition

    New search for: Fouad, O. A.
    New search for: Yamazato, M.
    New search for: Ahagon, H.
    New search for: Nagano, M.

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    Effect of in situ H2-plasma cleaning on TiSi2 film properties in plasma enhanced chemical vapor deposition

    New search for: Fouad, O. A.
    New search for: Yamazato, M.
    New search for: Ahagon, H.
    New search for: Nagano, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effect of in situ H2-plasma cleaning on TiSi2 film properties in plasma enhanced chemical vapor deposition

    New search for: Fouad, O. A.
    New search for: Yamazato, M.
    New search for: Ahagon, H.
    New search for: Nagano, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    Effect of in situ H2-plasma cleaning on TiSi2 film properties in plasma enhanced chemical vapor deposition

    Contributors:

    Fouad, O. A. (author) / Yamazato, M. (author) / Ahagon, H. (author) / Nagano, M. (author)

    Published in:

    MATERIALS LETTERS ; 57 ; 2965-2969

    Publication date:

    2003-01-01

    Size:

    5 pages

    ISSN:

    0167-577X

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.1105 / 530

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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