A platform for research: civil engineering, architecture and urbanism
Phase stability of epitaxial KTa~xNb~1~-~xO~3 thin films deposited by metalorganic chemical vapor deposition
Phase stability of epitaxial KTa~xNb~1~-~xO~3 thin films deposited by metalorganic chemical vapor deposition
Phase stability of epitaxial KTa~xNb~1~-~xO~3 thin films deposited by metalorganic chemical vapor deposition
Nichols, B. M. (author) / Hoerman, B. H. (author) / Hwang, J.-H. (author) / Mason, T. O. (author) / Wessels, B. W. (author)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 18 ; 106-110
2003-01-01
5 pages
Article (Journal)
English
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Characteristics of titanium dioxide films deposited by metalorganic chemical vapor deposition
British Library Online Contents | 2002
|Plasma-assisted metalorganic chemical vapor deposition growth of ZnO thin films
British Library Online Contents | 2006
|Metalorganic Chemical Vapor Deposition of High-T~C Superconducting Thin Films
British Library Online Contents | 1993
|British Library Online Contents | 1997
|British Library Online Contents | 2000
|