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Properties including step coverage of TiN thin films prepared by atomic layer deposition

Kim, J. / Hong, H. / Oh, K. / Lee, C.

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Properties including step coverage of TiN thin films prepared by atomic layer deposition

Kim, J. / Hong, H. / Oh, K. / Lee, C.

Properties including step coverage of TiN thin films prepared by atomic layer deposition

Kim, J. / Hong, H. / Oh, K. / Lee, C.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Properties including step coverage of TiN thin films prepared by atomic layer deposition

Contributors:

Kim, J. (author) / Hong, H. (author) / Oh, K. (author) / Lee, C. (author)

Published in:

APPLIED SURFACE SCIENCE ; 210 ; 231-239

Publication date:

2003-01-01

Size:

9 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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