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Ellipsometric analysis of ultrathin oxide layers on SIMOX wafers

Motooka, T. / Kusano, Y. / Nisihira, K. / Kato, N.

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Ellipsometric analysis of ultrathin oxide layers on SIMOX wafers

Motooka, T. / Kusano, Y. / Nisihira, K. / Kato, N.

Ellipsometric analysis of ultrathin oxide layers on SIMOX wafers

Motooka, T. / Kusano, Y. / Nisihira, K. / Kato, N.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

Title:

Ellipsometric analysis of ultrathin oxide layers on SIMOX wafers

Contributors:

Motooka, T. (author) / Kusano, Y. (author) / Nisihira, K. (author) / Kato, N. (author)

Published in:

APPLIED SURFACE SCIENCE ; 159-160 ; 111-115

Publication date:

2000-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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