Characterization of reactions at titanium/nickel silicide interface using X-ray photoelectron spectroscopy and transmission electron microscopy: Fid-Bau Portal

Characterization of reactions at titanium/nickel silicide interface using X-ray photoelectron spectroscopy and transmission electron microscopy

Zhao, J. / Lu, J. P. / Xu, Y. Q. / Kuan, Y. J. / Tsung, L.

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Characterization of reactions at titanium/nickel silicide interface using X-ray photoelectron spectroscopy and transmission electron microscopy

Zhao, J. / Lu, J. P. / Xu, Y. Q. / Kuan, Y. J. / Tsung, L.

Characterization of reactions at titanium/nickel silicide interface using X-ray photoelectron spectroscopy and transmission electron microscopy

Zhao, J. / Lu, J. P. / Xu, Y. Q. / Kuan, Y. J. / Tsung, L.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Characterization of reactions at titanium/nickel silicide interface using X-ray photoelectron spectroscopy and transmission electron microscopy

Contributors:

Zhao, J. (author) / Lu, J. P. (author) / Xu, Y. Q. (author) / Kuan, Y. J. (author) / Tsung, L. (author)

Published in:

APPLIED SURFACE SCIENCE ; 211 ; 367-372

Publication date:

2003-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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