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Electron capture kinetics at AlF3/SiO2 interfaces

Thurzo, I. / Kampen, T. U. / Zahn, D. R. / Konig, D.

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Electron capture kinetics at AlF3/SiO2 interfaces

Thurzo, I. / Kampen, T. U. / Zahn, D. R. / Konig, D.

Electron capture kinetics at AlF3/SiO2 interfaces

Thurzo, I. / Kampen, T. U. / Zahn, D. R. / Konig, D.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Electron capture kinetics at AlF3/SiO2 interfaces

Contributors:

Thurzo, I. (author) / Kampen, T. U. (author) / Zahn, D. R. (author) / Konig, D. (author)

Published in:

APPLIED SURFACE SCIENCE ; 212-213 ; 753-759

Publication date:

2003-01-01

Size:

7 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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