Diffusion barrier properties of nano-crystalline TiZrN films in Cu/Si contact systems: Fid-Bau Portal

Diffusion barrier properties of nano-crystalline TiZrN films in Cu/Si contact systems

Takeyama, M. B. / Itoi, T. / Aoyagi, E. / Noya, A.

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Diffusion barrier properties of nano-crystalline TiZrN films in Cu/Si contact systems

Takeyama, M. B. / Itoi, T. / Aoyagi, E. / Noya, A.

Diffusion barrier properties of nano-crystalline TiZrN films in Cu/Si contact systems

Takeyama, M. B. / Itoi, T. / Aoyagi, E. / Noya, A.

Access

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Diffusion barrier properties of nano-crystalline TiZrN films in Cu/Si contact systems

Contributors:

Takeyama, M. B. (author) / Itoi, T. (author) / Aoyagi, E. (author) / Noya, A. (author)

Published in:

APPLIED SURFACE SCIENCE ; 216 ; 181-186

Publication date:

2003-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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