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    Characterization of dielectric properties of ultrathin SiO2 film formed on Si substrate

    New search for: Hirose, K.
    New search for: Kitahara, H.
    New search for: Hattori, T.

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    Characterization of dielectric properties of ultrathin SiO2 film formed on Si substrate

    New search for: Hirose, K.
    New search for: Kitahara, H.
    New search for: Hattori, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Characterization of dielectric properties of ultrathin SiO2 film formed on Si substrate

    New search for: Hirose, K.
    New search for: Kitahara, H.
    New search for: Hattori, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    Characterization of dielectric properties of ultrathin SiO2 film formed on Si substrate

    Contributors:

    Hirose, K. (author) / Kitahara, H. (author) / Hattori, T. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 216 ; 351-355

    Publication date:

    2003-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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