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    Nanocrystal formation in Si implanted thin SiO2 layers under the influence of an absorbing interface

    New search for: Muller, T.
    New search for: Heinig, K. H.
    New search for: Moller, W.

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    Nanocrystal formation in Si implanted thin SiO2 layers under the influence of an absorbing interface

    New search for: Muller, T.
    New search for: Heinig, K. H.
    New search for: Moller, W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Nanocrystal formation in Si implanted thin SiO2 layers under the influence of an absorbing interface

    New search for: Muller, T.
    New search for: Heinig, K. H.
    New search for: Moller, W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Nanocrystal formation in Si implanted thin SiO2 layers under the influence of an absorbing interface

    Contributors:

    Muller, T. (author) / Heinig, K. H. (author) / Moller, W. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 101 ; 49-54

    Publication date:

    2003-01-01

    Size:

    6 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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