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    Si-SiO2 interface formation in low-dose low-energy separation by implanted oxygen materials

    New search for: Jutarosaga, T.
    New search for: Manne, S.
    New search for: Seraphin, S.

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    Si-SiO2 interface formation in low-dose low-energy separation by implanted oxygen materials

    New search for: Jutarosaga, T.
    New search for: Manne, S.
    New search for: Seraphin, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Si-SiO2 interface formation in low-dose low-energy separation by implanted oxygen materials

    New search for: Jutarosaga, T.
    New search for: Manne, S.
    New search for: Seraphin, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Si-SiO2 interface formation in low-dose low-energy separation by implanted oxygen materials

    Contributors:

    Jutarosaga, T. (author) / Manne, S. (author) / Seraphin, S. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 250 ; 168-181

    Publication date:

    2005-01-01

    Size:

    14 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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