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Influence of carrier and doping gases on the chemical vapor deposition of silicon quantum dots

Mazen, F. / Baron, T. / Bremond, G. / Hartmann, J. M. / Semeria, M. N.

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Influence of carrier and doping gases on the chemical vapor deposition of silicon quantum dots

Mazen, F. / Baron, T. / Bremond, G. / Hartmann, J. M. / Semeria, M. N.

Influence of carrier and doping gases on the chemical vapor deposition of silicon quantum dots

Mazen, F. / Baron, T. / Bremond, G. / Hartmann, J. M. / Semeria, M. N.

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Order at Subito €

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Document information

Title:

Influence of carrier and doping gases on the chemical vapor deposition of silicon quantum dots

Contributors:

Mazen, F. (author) / Baron, T. (author) / Bremond, G. (author) / Hartmann, J. M. (author) / Semeria, M. N. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 101 ; 164-168

Publication date:

2003-01-01

Size:

5 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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