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Characterization of silicon oxynitride thin films deposited by electron beam physical vapor deposition technique

Mohite, K. C. / Khollam, Y. B. / Mandale, A. B. / Patil, K. R. / Takwale, M. G.

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Characterization of silicon oxynitride thin films deposited by electron beam physical vapor deposition technique

Mohite, K. C. / Khollam, Y. B. / Mandale, A. B. / Patil, K. R. / Takwale, M. G.

Characterization of silicon oxynitride thin films deposited by electron beam physical vapor deposition technique

Mohite, K. C. / Khollam, Y. B. / Mandale, A. B. / Patil, K. R. / Takwale, M. G.

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Document information

Title:

Characterization of silicon oxynitride thin films deposited by electron beam physical vapor deposition technique

Contributors:

Mohite, K. C. (author) / Khollam, Y. B. (author) / Mandale, A. B. (author) / Patil, K. R. (author) / Takwale, M. G. (author)

Published in:

MATERIALS LETTERS ; 57 ; 4170-4175

Publication date:

2003-01-01

Size:

6 pages

ISSN:

0167-577X

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.1105 / 530

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