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Structural analysis of silicon oxynitride films deposited by PECVD

Criado, D. / Alayo, M. I. / Pereyra, I. / Fantini, M. C.

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Structural analysis of silicon oxynitride films deposited by PECVD

Criado, D. / Alayo, M. I. / Pereyra, I. / Fantini, M. C.

Structural analysis of silicon oxynitride films deposited by PECVD

Criado, D. / Alayo, M. I. / Pereyra, I. / Fantini, M. C.

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Title:

Structural analysis of silicon oxynitride films deposited by PECVD

Contributors:

Criado, D. (author) / Alayo, M. I. (author) / Pereyra, I. (author) / Fantini, M. C. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 112 ; 123-127

Publication date:

2004-01-01

Size:

5 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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