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    Characterisation of oxygen and oxygen-related defects in highly- and lowly-doped silicon

    New search for: Simoen, E.
    New search for: Claeys, C.
    New search for: Loo, R.
    New search for: De Gryse, O.
    New search for: Clauws, P.
    New search for: Job, R.
    New search for: Ulyashin, A. G.
    New search for: Fahrner, W.

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    Characterisation of oxygen and oxygen-related defects in highly- and lowly-doped silicon

    New search for: Simoen, E.
    New search for: Claeys, C.
    New search for: Loo, R.
    New search for: De Gryse, O.
    New search for: Clauws, P.
    New search for: Job, R.
    New search for: Ulyashin, A. G.
    New search for: Fahrner, W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Characterisation of oxygen and oxygen-related defects in highly- and lowly-doped silicon

    New search for: Simoen, E.
    New search for: Claeys, C.
    New search for: Loo, R.
    New search for: De Gryse, O.
    New search for: Clauws, P.
    New search for: Job, R.
    New search for: Ulyashin, A. G.
    New search for: Fahrner, W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Characterisation of oxygen and oxygen-related defects in highly- and lowly-doped silicon

    Contributors:

    Simoen, E. (author) / Claeys, C. (author) / Loo, R. (author) / De Gryse, O. (author) / Clauws, P. (author) / Job, R. (author) / Ulyashin, A. G. (author) / Fahrner, W. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 102 ; 207-212

    Publication date:

    2003-01-01

    Size:

    6 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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