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Helium implantation in silicon: the effects of implantation temperature

Oliviero, E. / David, M. L. / Fedorov, A. V. / van Veen, A. / Beaufort, M. F. / Barbot, J. F.

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Helium implantation in silicon: the effects of implantation temperature

Oliviero, E. / David, M. L. / Fedorov, A. V. / van Veen, A. / Beaufort, M. F. / Barbot, J. F.

Helium implantation in silicon: the effects of implantation temperature

Oliviero, E. / David, M. L. / Fedorov, A. V. / van Veen, A. / Beaufort, M. F. / Barbot, J. F.

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Check availability in my library

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Document information

Title:

Helium implantation in silicon: the effects of implantation temperature

Contributors:

Oliviero, E. (author) / David, M. L. (author) / Fedorov, A. V. (author) / van Veen, A. (author) / Beaufort, M. F. (author) / Barbot, J. F. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 102 ; 222-227

Publication date:

2003-01-01

Size:

6 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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