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Surface characteristics of MOCVD grown TiO2 films by atomic force microscopy
Surface characteristics of MOCVD grown TiO2 films by atomic force microscopy
Surface characteristics of MOCVD grown TiO2 films by atomic force microscopy
Park, Y. B. (author) / Ahn, K. H. (author) / Park, D. W. (author)
JOURNAL OF MATERIALS SCIENCE LETTERS ; 22 ; 1325-1328
2003-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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