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Effect of deposition temperature on the characteristics of hafnium oxide films deposited by metalorganic chemical vapor deposition using amide precursor
Effect of deposition temperature on the characteristics of hafnium oxide films deposited by metalorganic chemical vapor deposition using amide precursor
Effect of deposition temperature on the characteristics of hafnium oxide films deposited by metalorganic chemical vapor deposition using amide precursor
Takahashi, K. (author) / Funakubo, H. (author) / Hino, S. (author) / Nakayama, M. (author) / Ohashi, N. (author) / Kiguchi, T. (author) / Tokumitsu, E. (author)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH THEN WARRENDALE- ; 19 ; 584-589
2004-01-01
6 pages
Article (Journal)
English
DDC:
620.11
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