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Low-temperature silicon homoepitaxial growth by pulsed magnetron sputtering

Reinig, P. / Fenske, F. / Selle, B. / Bohne, W. / Rohrich, J. / Sieber, I. / Fuhs, W.

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Low-temperature silicon homoepitaxial growth by pulsed magnetron sputtering

Reinig, P. / Fenske, F. / Selle, B. / Bohne, W. / Rohrich, J. / Sieber, I. / Fuhs, W.

Low-temperature silicon homoepitaxial growth by pulsed magnetron sputtering

Reinig, P. / Fenske, F. / Selle, B. / Bohne, W. / Rohrich, J. / Sieber, I. / Fuhs, W.

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Document information

Title:

Low-temperature silicon homoepitaxial growth by pulsed magnetron sputtering

Contributors:

Reinig, P. (author) / Fenske, F. (author) / Selle, B. (author) / Bohne, W. (author) / Rohrich, J. (author) / Sieber, I. (author) / Fuhs, W. (author)

Published in:

APPLIED SURFACE SCIENCE ; 227 ; 114-121

Publication date:

2004-01-01

Size:

8 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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