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Characteristics of SnO~2 Thin Films Deposited by RF Magnetron Sputtering

Ryu, H. W. / Park, Y. J. / Noh, H. S. / Park, J. S.

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Characteristics of SnO~2 Thin Films Deposited by RF Magnetron Sputtering

Ryu, H. W. / Park, Y. J. / Noh, H. S. / Park, J. S.

Characteristics of SnO~2 Thin Films Deposited by RF Magnetron Sputtering

Ryu, H. W. / Park, Y. J. / Noh, H. S. / Park, J. S.

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Document information

Title:

Characteristics of SnO~2 Thin Films Deposited by RF Magnetron Sputtering

Contributors:

Ryu, H. W. (author) / Park, Y. J. (author) / Noh, H. S. (author) / Park, J. S. (author) / Kang, S.-G. / Kobayashi, T.

Published in:

Designing, Processing and Properties of Advanced Engineering Materials PART 2 ; 993-996

MATERIALS SCIENCE FORUM ; 449/452

Publication date:

2004-01-01

Size:

4 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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