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    Elasticity and resistivity study on the electromigration effects observed in aluminum-silicon-copper alloy thin films

    New search for: Mizubayashi, H.
    New search for: Kashimura, D.
    New search for: Yokota, K.
    New search for: Tanimoto, H.

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    Elasticity and resistivity study on the electromigration effects observed in aluminum-silicon-copper alloy thin films

    New search for: Mizubayashi, H.
    New search for: Kashimura, D.
    New search for: Yokota, K.
    New search for: Tanimoto, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Elasticity and resistivity study on the electromigration effects observed in aluminum-silicon-copper alloy thin films

    New search for: Mizubayashi, H.
    New search for: Kashimura, D.
    New search for: Yokota, K.
    New search for: Tanimoto, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Document information
    Title:

    Elasticity and resistivity study on the electromigration effects observed in aluminum-silicon-copper alloy thin films

    Contributors:

    Mizubayashi, H. (author) / Kashimura, D. (author) / Yokota, K. (author) / Tanimoto, H. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING A ; 370 ; 168-171

    Publication date:

    2004-01-01

    Size:

    4 pages

    ISSN:

    0921-5093

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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