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Effect of argon ion beam voltages on the microstructure of aluminum nitride films prepared at room temperature by a dual ion beam sputtering system
Effect of argon ion beam voltages on the microstructure of aluminum nitride films prepared at room temperature by a dual ion beam sputtering system
Effect of argon ion beam voltages on the microstructure of aluminum nitride films prepared at room temperature by a dual ion beam sputtering system
Chen, H. Y. (author) / Han, S. (author) / Cheng, C. H. (author) / Shih, H. C. (author)
APPLIED SURFACE SCIENCE ; 228 ; 128-134
2004-01-01
7 pages
Article (Journal)
English
DDC:
621.35
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