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Electrochemical characterization of copper chemical mechanical planarization in KIO3 slurry

Du, T. / Tamboli, D. / Luo, Y. / Desai, V.

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Electrochemical characterization of copper chemical mechanical planarization in KIO3 slurry

Du, T. / Tamboli, D. / Luo, Y. / Desai, V.

Electrochemical characterization of copper chemical mechanical planarization in KIO3 slurry

Du, T. / Tamboli, D. / Luo, Y. / Desai, V.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Electrochemical characterization of copper chemical mechanical planarization in KIO3 slurry

Contributors:

Du, T. (author) / Tamboli, D. (author) / Luo, Y. (author) / Desai, V. (author)

Published in:

APPLIED SURFACE SCIENCE ; 229 ; 167-174

Publication date:

2004-01-01

Size:

8 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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