Patterned nanoporous poly(methylsilsesquioxane) thin films: a potential high density substrate: Fid-Bau Portal

Patterned nanoporous poly(methylsilsesquioxane) thin films: a potential high density substrate

Hogan, Z. L. / Kreller, C. R. / Tran, K. A. / Hart, M. W. / Wallraff, G. M. / Swanson, S. A. / Volksen, W. / Lee, V. Y. / Magbitang, T. P. / Hedrick, J. L.

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Patterned nanoporous poly(methylsilsesquioxane) thin films: a potential high density substrate

Hogan, Z. L. / Kreller, C. R. / Tran, K. A. / Hart, M. W. / Wallraff, G. M. / Swanson, S. A. / Volksen, W. / Lee, V. Y. / Magbitang, T. P. / Hedrick, J. L.

Patterned nanoporous poly(methylsilsesquioxane) thin films: a potential high density substrate

Hogan, Z. L. / Kreller, C. R. / Tran, K. A. / Hart, M. W. / Wallraff, G. M. / Swanson, S. A. / Volksen, W. / Lee, V. Y. / Magbitang, T. P. / Hedrick, J. L.

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Title:

Patterned nanoporous poly(methylsilsesquioxane) thin films: a potential high density substrate

Contributors:

Hogan, Z. L. (author) / Kreller, C. R. (author) / Tran, K. A. (author) / Hart, M. W. (author) / Wallraff, G. M. (author) / Swanson, S. A. (author) / Volksen, W. (author) / Lee, V. Y. (author) / Magbitang, T. P. (author) / Hedrick, J. L. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -AMSTERDAM THEN LAUSANNE- C ; 24 ; 487-490

Publication date:

2004-01-01

Size:

4 pages

ISSN:

0928-4931

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.1 / 660

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