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Batch Processing Method to Deposit a-Si:H Films by PECVD

Raniero, L. / Aguas, H. / Pereira, L. / Fortunato, E. / Ferreira, I. / Martins, R.

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Batch Processing Method to Deposit a-Si:H Films by PECVD

Raniero, L. / Aguas, H. / Pereira, L. / Fortunato, E. / Ferreira, I. / Martins, R.

Batch Processing Method to Deposit a-Si:H Films by PECVD

Raniero, L. / Aguas, H. / Pereira, L. / Fortunato, E. / Ferreira, I. / Martins, R.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Batch Processing Method to Deposit a-Si:H Films by PECVD

Contributors:

Raniero, L. (author) / Aguas, H. (author) / Pereira, L. (author) / Fortunato, E. (author) / Ferreira, I. (author) / Martins, R. (author)

Published in:

MATERIALS SCIENCE FORUM ; 455/456 ; 104-107

Publication date:

2004-01-01

Size:

4 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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