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Nanostructural features of nc-Si:H thin films prepared by PECVD

Shim, J. H. / Im, S. / Cho, N. H.

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Nanostructural features of nc-Si:H thin films prepared by PECVD

Shim, J. H. / Im, S. / Cho, N. H.

Nanostructural features of nc-Si:H thin films prepared by PECVD

Shim, J. H. / Im, S. / Cho, N. H.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Nanostructural features of nc-Si:H thin films prepared by PECVD

Contributors:

Shim, J. H. (author) / Im, S. (author) / Cho, N. H. (author)

Published in:

APPLIED SURFACE SCIENCE ; 234 ; 268-273

Publication date:

2004-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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Feng, R.-h. / Zhang, X.-w. / Han, G.-r. | British Library Online Contents | 2008