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Nanostructural and PL Features of nc-Si:H Thin Films Prepared by PECVD Techniques

Shim, J. H. / Cho, N. H. / Im, S. G.

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Nanostructural and PL Features of nc-Si:H Thin Films Prepared by PECVD Techniques

Shim, J. H. / Cho, N. H. / Im, S. G.

Nanostructural and PL Features of nc-Si:H Thin Films Prepared by PECVD Techniques

Shim, J. H. / Cho, N. H. / Im, S. G.

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Check availability in my library

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Document information

Title:

Nanostructural and PL Features of nc-Si:H Thin Films Prepared by PECVD Techniques

Contributors:

Shim, J. H. (author) / Cho, N. H. (author) / Im, S. G. (author) / Kang, S.-G. / Kobayashi, T.

Published in:

Designing, Processing and Properties of Advanced Engineering Materials PART 2 ; 1017-1020

MATERIALS SCIENCE FORUM ; 449/452

Publication date:

2004-01-01

Size:

4 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

Shim, J. H. / Im, S. / Cho, N. H. | British Library Online Contents | 2004

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