Role of Substrate on the Growth Process of Polycrystalline Silicon Thin Films by Low-Pressure Chemical Vapour Deposition: Fid-Bau Portal

Role of Substrate on the Growth Process of Polycrystalline Silicon Thin Films by Low-Pressure Chemical Vapour Deposition

Pereira, L. / Aguas, H. / Raniero, L. / Martins, R. M. S. / Fortunato, E. / Martins, R.

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Role of Substrate on the Growth Process of Polycrystalline Silicon Thin Films by Low-Pressure Chemical Vapour Deposition

Pereira, L. / Aguas, H. / Raniero, L. / Martins, R. M. S. / Fortunato, E. / Martins, R.

Role of Substrate on the Growth Process of Polycrystalline Silicon Thin Films by Low-Pressure Chemical Vapour Deposition

Pereira, L. / Aguas, H. / Raniero, L. / Martins, R. M. S. / Fortunato, E. / Martins, R.

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Check availability in my library

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Document information

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Document information

Title:

Role of Substrate on the Growth Process of Polycrystalline Silicon Thin Films by Low-Pressure Chemical Vapour Deposition

Contributors:

Pereira, L. (author) / Aguas, H. (author) / Raniero, L. (author) / Martins, R. M. S. (author) / Fortunato, E. (author) / Martins, R. (author)

Published in:

MATERIALS SCIENCE FORUM ; 455/456 ; 112-115

Publication date:

2004-01-01

Size:

4 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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