A platform for research: civil engineering, architecture and urbanism
Arsenic shallow depth profiling: accurate quantification in SiO~2/Si stack
Arsenic shallow depth profiling: accurate quantification in SiO~2/Si stack
Arsenic shallow depth profiling: accurate quantification in SiO~2/Si stack
Barozzi, M. (author) / Giubertoni, D. (author) / Anderle, M. (author) / Bersani, M. (author)
APPLIED SURFACE SCIENCE ; 231/232 ; 632-635
2004-01-01
4 pages
Article (Journal)
English
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Accurate depth profiling for ultra-shallow implants using backside-SIMS
British Library Online Contents | 2004
|Ultra-shallow arsenic implant depth profiling using low-energy nitrogen beams
British Library Online Contents | 2004
|Improved near surface characterization of shallow arsenic distribution by SIMS depth profiling
British Library Online Contents | 2004
|Accurate SIMS depth profiling for ultra-shallow implants using backside SIMS
British Library Online Contents | 2003
|Ultra Shallow Depth Profiling with SIMS
British Library Online Contents | 2008
|