Chemical mechanical polishing of copper for multilevel metallization

Stavreva, Z. / Zeidler, D. / Ploetner, M. et al. | British Library Online Contents | 1996

A new metal-organic chemical vapor deposition process for selective copper metallization

Norman, J. A. T. / Muratore, B. A. / Dyer, P. N. et al. | British Library Online Contents | 1993

Chemical Vapor Deposition of Copper for IC Metallization: Precursor Chemistry and Molecular Structure

Doppelt, P. / Baum, T. H. | British Library Online Contents | 1994

Chemical Vapor Deposition of Cr-Based Thin Films as Diffusion Barriers in Copper Metallization

Maury, F. / Gasqueres, C. / Duminica, F.-D. et al. | British Library Online Contents | 2003

Tantalum diffusion barrier grown by inorganic plasma-promoted chemical vapor deposition: Performance in copper metallization

Kaloyeros, A. E. / Chen, X. / Lane, S. et al. | British Library Online Contents | 2000